Wikimedi'Òc

Wafertraksystem.jpg - Chaiken

Spinner.jpg - Selakant

EVG 120 resist coater-developer at LAAS 0434.jpg - Guillom

Photoresist spin-coaters at LAAS 0448.jpg - Guillom

StencilLithography.jpg - Malangali

Sorg impatto elettronico.jpg - Angelochimisso

Litografia elettronica.jpg - Marco de meis

LIGA-Process-00.png - Kopiersperre

Micropatterns-fibronectin-glass.tif - Micropatternsguy

Micropatterns-fibronectin-glass.png - Micropatternsguy

Soft lithography proc 2.jpg - File Upload Bot (Magnus Manske)

Soft lithography proc 1.jpg - File Upload Bot (Magnus Manske)

Inking and Contact Process.JPG - Tkmaxwell

PDMS stamp defects.JPG - Tkmaxwell

Write erase bit.tiff - Tdill88

Thermal polymer decomp.tiff - Tdill88

Spin-coater for resist coating (DE).svg - Cepheiden

Spectrum of lithography lights.PNG - Shigeru23

193i continuation.PNG - File Upload Bot (Magnus Manske)

Microfabrication NFP.tif - SreeBot

Photolithography 2.JPG - MGA73bot2

Fotolitograafia.png - TriinK

Scattered light from phase defect.JPG - Hydriz

LitRo3.jpg - Mahtabstar

LitRo4.jpg - Mahtabstar

LitRo5.jpg - Mahtabstar

LitRo6.jpg - Mahtabstar

Pellicle Mounting Machine MLI.jpg - Vosselectronic

Magnetic field assisted micro contact printing.png - Jccau

Macrotimbre 2.png - Jccau

Protocol for magnetic stamp.png - Jccau

Overview 3.jpg - Denis Elbl, KIT

Soft lithography proc2.svg - Fred the Oyster

Soft lithography proc1.svg - Fred the Oyster

Inking and contact process.svg - Fred the Oyster

Creating the PDMS master.svg - Fred the Oyster

PDMS stamp defect.svg - Fred the Oyster

Microfabrication of Nanofountain probe.svg - Fred the Oyster

FIB Microhole Arrays.tif - Meltem Sezen

Depth-of-focus.JPG - FastilyClone

Nanoimprint proximity effect.jpeg - OgreBot

Extended double patterning.PNG - OgreBot

CD 3s vs dose.png - FastilyClone

Non-telecentricity.png - OgreBot

1x nm hp double patterned cuts.png - FastilyClone

27 nm pitch cut patterning.png - FastilyClone

Cut exposure reduction.png - FastilyClone

Outgassing contamination vs dose.png - OgreBot

Undersized contact.png - FastilyClone

Projected cost trend of SADP.png - OgreBot

Feature stitching across fields.png - FastilyClone

Wavelength dependence of shot noise.png - OgreBot

EUV mask defect printability.png - FastilyClone

CD sensitivity to multilayer buried defect.png - OgreBot

Multipatterning-friendly layout.png - FastilyClone

Secondary electron depth in resist.png - OgreBot

Single-mask SID SADP.png - OgreBot

Self-aligned via patterning.png - Guiding light

EUVL printable defects.png - FastilyClone

Shot noise CD variation.png - FastilyClone

Mask-assisted spacer self-trimming.png - OgreBot

Node progress.png - OgreBot

Sidewall profile modulation.png - FastilyClone

Honeycomb structure patterning.png - OgreBot

SAQP over SADP.png - FastilyClone

Self-trimming with isotropic etch.png - Guiding light

16 nm hp Patterning Cost Comparison.png - Guiding light

Converging number of cuts.png - FastilyClone

Nanosize 3D model of a vintage ZEISS microscope, by Nanoscribe (29829841445).jpg - Pigsonthewing

1D SADP single mask.png - FastilyClone

Wider T2T SID.png - Guiding light

Borodovsky challenge LELELE.png - Guiding light

Binary vs PSM NILS.png - FastilyClone

SID-SIM-SID SAQP LE Asymmetric.png - Daylen

PDMS polümeerist muster mikrokontaktprintimise jaoks.tif - Kkrigul

Nanojäljendlitograafia.jpg - PTeppor

36 nm pitch vertical line T2T.png - Willy1018

36 nm pitch 2-bar CD delta vs focus.png - Willy1018

4X-nm hp SMO.png - Joeyvandernaald

2D Illumination requirement.png - OgreBot

Asymmetric 2D SAQP with LE2 block.png - OgreBot

7nm node metal pattern shifts through EUV focus.png - OgreBot

Assist feature OPC.png - Guiding light

Optical proximity correction.png - LithoGuy

Defocus of subresolution assist features.png - Guiding light

Defocus pattern shift vs wavelength.png - Hippymoose17

EUV dose increase for smaller size.png - Guiding light

EUV stochastic EPE.png - Guiding light

Contrast reduction vs photon noise.png - Guiding light

EUV vs DUV image shot noise.png - Guiding light

DUV vs EUV line edge variability.png - Guiding light

EUV 2D edge stochastic variability.png - Guiding light

EUV contact-to-contact area variation.png - Guiding light

Sub-0.5 k1 brick pattern.png - Guiding light

Stochastic overlay.png - Guiding light

1st order obscuration.png - Guiding light

Image shift vs illumination pole.png - Guiding light

NXE3400 TPT vs dose.png - Guiding light

Lower vs higher blur stochastics.png - Guiding light

26 nm pitch vs 52 nm pitch with obscuration.png - Guiding light

Via Triple Patterning for EUV.png - Guiding light

Different illumination angles different images.png - Guiding light

H and V shadowing across EUV slit.png - Guiding light

SAQP flow for SAB.png - Guiding light

EUV Stochastic Hot Spots.png - Guiding light

Photoelectron trajectories vs dose.png - Guiding light

EUV High-NA stochastic sidelobes.png - Guiding light

Impact of electron spread function.png - Guiding light

High-NA EUV forbidden illumination combinations.png - Guiding light

Cut overlay issues.png - Guiding light

P28 dipole leaf image fading.png - Guiding light

Screenshot 20230216 130758 PowerPoint.jpg - Guiding light

Secondary Electrons from Layers under EUV Resist.png - Guiding light

Stitch Double Patterning.png - Guiding light

Spread of electrons outside EUV exposure area.png - Guiding light

Strukturbreiten über Zeit DE.svg - PantheraLeo1359531

Strukturbreiten (Prozessoren) über Zeit EN.svg - PantheraLeo1359531